The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2020
Filed:
Aug. 30, 2018
Asml Netherlands B.v., Veldhoven, NL;
Sietse Thijmen Van Der Post, Utrecht, NL;
Stefan Michael Bruno Bäumer, Valkenswaard, NL;
Peter Danny Van Voorst, Nijmegen, NL;
Teunis Willem Tukker, Eindhoven, NL;
Ferry Zijp, Nuenen, NL;
Han-Kwang Nienhuys, Utrecht, NL;
Jacobus Maria Antonius Van Den Eerenbeemd, Nuenen, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An optical system (OS) for focusing a beam of radiation (B) on a region of interest in a metrology apparatus is described. The beam of radiation (B) comprises radiation in a soft X-ray or Extreme Ultraviolet spectral range. The optical system (OS) comprises a first stage (S) for focusing the beam of radiation at an intermediate focus region. The optical system (OS) comprises a second stage (S) for focusing the beam of radiation from the intermediate focus region onto the region of interest. The first and second stages each comprise a Kirkpatrick-Baez reflector combination. At least one reflector comprises an aberration-correcting reflector.