The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2020
Filed:
Oct. 12, 2017
Wuhan China Star Optoelectronics Technology Co., Ltd., Wuhan, Hubei, CN;
Abstract
A method of manufacturing a substrate of a display device is provided. The method includes: providing a substrate body; coating a photoresist layer on the substrate body; exposing the photoresist layer by using a plurality lenses of an exposure machine through a mask, wherein the mask includes a light incident region and a light overlap region, the light overlap region includes a transparent zone and a non-transparent zone, and the light incident region includes a transparent zone and a non-transparent zone, and wherein an area of each transparent zone of the light overlap region is larger or smaller than an area of each transparent zone of the light incident region; and developing the photoresist layer after exposing to obtain a photoresist pattern. The embodiment of the disclosure also provides a mask applied to the method. By practice of the disclosure, the exposure pattern of the light overlap region could be compensated in order to obtain more accurate exposure pattern, so the product yield could be improved.