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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10724137 B1

PDFFull Text
Date of Patent:
Jul. 28, 2020

Filed:

Jan. 28, 2014

Cleaning method, method of manufacturing semiconductor device, substrate processing apparatus, recording medium, and cleaning completion determining method

Applicant:

Hitachi Kokusai Electric Inc., Tokyo, JP;

Inventors:

Osamu Morita, Toyama, JP;

Shinichiro Mori, Toyama, JP;

Kenji Kameda, Toyama, JP;

Assignee:

KOKUSAI ELETRIC CORPORATION, Tokyo, JP;

Attorney:

Volpe and Koenig, P.C.

Primary Examiner:

Jeffrie R Lund

Assistant Examiner:

Stanislav Antolin

Int. Cl.
CPC ...
C23C 16/44 (2006.01); H01J 37/32 (2006.01); C23C 16/22 (2006.01); C23C 16/52 (2006.01); H01L 21/66 (2006.01); C23C 16/24 (2006.01); C23C 16/455 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4405 (2013.01); C23C 16/22 (2013.01); C23C 16/4412 (2013.01); C23C 16/52 (2013.01); H01J 37/32862 (2013.01); H01J 37/32981 (2013.01); H01L 22/26 (2013.01); C23C 16/24 (2013.01); C23C 16/4408 (2013.01); C23C 16/45561 (2013.01); H01J 2237/022 (2013.01); H01J 2237/0225 (2013.01); H01L 21/02043 (2013.01);
Abstract

According to one aspect of the present disclosure, there is provided a cleaning method including: cleaning a component in which a deposit adhering to the component constituting an apparatus is removed by supplying and discharging a cleaning gas, wherein the act of cleaning includes controlling the apparatus so that a signal, which indicates a concentration of a predetermined gas generated by a reaction of the deposit and the cleaning gas, reaches a predetermined upper limit value or less and then stays within a range between the predetermined upper limit value and a predetermined lower limit value for a predetermined time period.

Find Patent Forward Citations

Morita, Osamu. (2020). Cleaning method, method of manufacturing semiconductor device, substrate processing apparatus, recording medium, and cleaning completion determining method (U.S. Patent No. 10724137). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10724137

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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