The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 21, 2020

Filed:

Sep. 29, 2017
Applicant:

Ulvac, Inc., Chigasaki-shi, JP;

Inventors:

Ken Maehira, Chigasaki, JP;

Kou Fuwa, Chigasaki, JP;

Assignee:

ULVAC, INC., Chigasaki-shi, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H02N 13/00 (2006.01); H01L 21/683 (2006.01); H01L 21/67 (2006.01); B23Q 3/15 (2006.01); H01J 37/32 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
H02N 13/00 (2013.01); B23Q 3/15 (2013.01); H01J 37/32715 (2013.01); H01J 37/34 (2013.01); H01L 21/67253 (2013.01); H01L 21/683 (2013.01); H01L 21/6833 (2013.01);
Abstract

Providing a technique for suppressing dust generation at the time of attraction and detachment of an object to be attracted, and for enabling control the attraction force of the attraction device to be uniform. The attraction device of the present invention includes a main body part having attraction electrodes within a dielectric; and an attraction part for attracting a substrate, provided on a surface of the main body part at an attraction-side. The attraction part includes a contact support part that is in contact with, and supports the substrate and a non-contact part that is not in contact with the substrate. In the attraction part, the volume resistivity of the material of the contact support part is greater than the volume resistivity of the material of the non-contact part.


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