The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 21, 2020

Filed:

Apr. 13, 2017
Applicant:

Fujitsu Limited, Kawasaki-shi, Kanagawa, JP;

Inventors:

Shigekazu Okumura, Setagaya, JP;

Shuichi Tomabechi, Atsugi, JP;

Ryo Suzuki, Fujisawa, JP;

Assignee:

FUJITSU LIMITED, Kawasaki, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 31/0304 (2006.01); H01L 27/144 (2006.01); H01L 21/02 (2006.01); H01L 31/0352 (2006.01); H01L 31/18 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1443 (2013.01); H01L 21/02395 (2013.01); H01L 21/02398 (2013.01); H01L 21/02466 (2013.01); H01L 21/02507 (2013.01); H01L 21/02549 (2013.01); H01L 21/02576 (2013.01); H01L 21/02579 (2013.01); H01L 21/02631 (2013.01); H01L 27/1446 (2013.01); H01L 31/03046 (2013.01); H01L 31/035236 (2013.01); H01L 31/1844 (2013.01);
Abstract

A semiconductor crystal substrate includes a crystal substrate that is formed of a material including one of GaSb and InAs, a first buffer layer that is formed on the crystal substrate and formed of a material including GaSb, and a second buffer layer that is formed on the first buffer layer and formed of a material including GaSb. The first buffer layer has a p-type conductivity, and the second buffer layer has an n-type conductivity.


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