The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 21, 2020

Filed:

Jan. 23, 2019
Applicant:

Jeol Ltd., Tokyo, JP;

Inventor:

Hidetaka Sawada, Tokyo, JP;

Assignee:

JEOL Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/153 (2006.01); H01J 37/26 (2006.01);
U.S. Cl.
CPC ...
H01J 37/153 (2013.01); H01J 37/261 (2013.01); H01J 2237/1405 (2013.01); H01J 2237/1532 (2013.01); H01J 2237/1534 (2013.01); H01J 2237/28 (2013.01);
Abstract

An aberration corrector for an electron microscope includes a geometric aberration corrector provided with a transfer lens system, wherein the transfer lens system includes an optical system for chromatic aberration correction, the optical system for chromatic aberration correction has a first portion, a second portion, and a third portion disposed along an optical axis, and each of the first portion, the second portion, and the third portion has a thickness in a direction along the optical axis and generates an electromagnetic field having two-fold symmetry in which an electric field having two-fold symmetry and a magnetic field having two-fold symmetry are superimposed.


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