The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 2020
Filed:
Jun. 22, 2015
Applicant:
Hitachi High-technologies Corporation, Tokyo, JP;
Inventors:
Naoko Senda, Tokyo, JP;
Kentaro Osawa, Tokyo, JP;
Assignee:
HITACHI HIGH-TECH CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C12M 1/34 (2006.01); C12M 3/00 (2006.01); C12M 1/36 (2006.01);
U.S. Cl.
CPC ...
C12M 41/46 (2013.01); C12M 21/08 (2013.01); C12M 41/36 (2013.01); C12M 41/48 (2013.01);
Abstract
Provided is a method for non-invasively and quantitatively determining multilayerization and differentiation when culturing a cell sheet. Provided is a method for determining a cell state by imaging a cell sheet by using an optical instrument characterized by having a high resolution, and then analyzing the inner structure thereof.
Quick Actions:
Senda, Naoko. (2020). Cell culture device and image analysis device (U.S. Patent No. 10717962). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10717962
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile