The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 21, 2020

Filed:

Aug. 12, 2015
Applicant:

Nissan Chemical Industries, Ltd., Tokyo, JP;

Inventors:

Naoya Nishimura, Funabashi, JP;

Takahiro Kaseyama, Funabashi, JP;

Kei Yasui, Funabashi, JP;

Daisuke Maeda, Funabashi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 73/06 (2006.01); G03F 7/38 (2006.01); G03F 7/022 (2006.01); G03F 7/038 (2006.01); G03F 7/30 (2006.01); G03F 7/00 (2006.01); G03F 7/039 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01);
U.S. Cl.
CPC ...
C08G 73/0644 (2013.01); C08G 73/06 (2013.01); G03F 7/0007 (2013.01); G03F 7/022 (2013.01); G03F 7/038 (2013.01); G03F 7/039 (2013.01); G03F 7/0392 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2002 (2013.01); G03F 7/30 (2013.01); G03F 7/322 (2013.01);
Abstract

It is possible to obtain a thin film that can form a minute pattern and that has a high index of refraction by using a polymer containing a triazine ring and containing a repeating unit structure represented for example by formula (22) or (26).


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