The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 21, 2020

Filed:

Sep. 06, 2018
Applicant:

Shin-etsu Chemical Co., Ltd., Tokyo, JP;

Inventors:

Jun Hatakeyama, Joetsu, JP;

Shiori Nonaka, Joetsu, JP;

Yuji Harada, Joetsu, JP;

Ryo Mitsui, Joetsu, JP;

Osamu Watanabe, Joetsu, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 18/73 (2006.01); C08G 18/38 (2006.01); C08G 18/75 (2006.01); C08G 18/76 (2006.01); C08G 18/79 (2006.01); C08J 5/18 (2006.01); C07F 7/08 (2006.01); C09D 175/16 (2006.01); C08G 77/458 (2006.01); C08G 18/61 (2006.01); H04B 1/3827 (2015.01);
U.S. Cl.
CPC ...
C08G 18/3893 (2013.01); C07F 7/0838 (2013.01); C07F 7/0879 (2013.01); C08G 18/61 (2013.01); C08G 18/73 (2013.01); C08G 18/755 (2013.01); C08G 18/758 (2013.01); C08G 18/7614 (2013.01); C08G 18/797 (2013.01); C08G 77/458 (2013.01); C08J 5/18 (2013.01); C09D 175/16 (2013.01); C08J 2375/04 (2013.01); H04B 1/385 (2013.01);
Abstract

The present invention provides a silicon-containing compound shown by the following formula (1): wherein R, R, R, R, R, and Reach independently represent a linear, branched, or cyclic alkyl group having 1 to 6 carbon atoms, a phenyl group, a 3,3,3-trifluoropropyl group, or a group shown by —(OSiRR)—OSiRRR; R, R, R, R, and Rhave the same meanings as Rto R; X represents a linear or branched alkylene group having 3 to 7 carbon atoms optionally having an ether group; and 'n' is an integer in the range of 0 to 100. This provides a stretchable film that has excellent stretchability and strength, with the film surface having excellent repellency, and a method for forming the same; as well as a urethane resin used for the stretchable film; and a silicon-containing compound to be a material of the urethane resin.


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