The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2020
Filed:
Sep. 18, 2017
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Hans Jansen, Eindhoven, NL;
Marco Koert Stavenga, Eindhoven, NL;
Jacobus Johannus Leonardus Hendricus Verspay, Thorn, NL;
Franciscus Johannes Joseph Janssen, Eindhoven, NL;
Anthonie Kuijper, Bruegel, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70858 (2013.01); G03F 7/2041 (2013.01); G03F 7/70341 (2013.01);
Abstract
An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.