Shutter device used for exposure in lithography machine, and method for use thereof

Abstract

A shutter device for use in exposure by a photolithography machine and a method of using the shutter device are disclosed. The device includes a shutter blade (); a rotating motor () for driving the shutter blade () to rotate; a controller in electric connection with the rotating motor (); and a supporter () for supporting the rotating motor (). The shutter blade () includes a rotation center () and, disposed in correspondence with the rotation center (), at least one open portion () and at least one shielding portion (). The rotation center () is coupled to the rotating motor () which drives the shutter blade () to rotate so that the shutter device opening and closure are accomplished to enable and disable exposure. The shielding portion () includes a hollow portion () which significantly reduces the mass of the shutter blade (), thereby facilitating the control over the rotation of the shutter blade (). Under the control of the controller, the opening and closing of the shutter is accomplished during rotation of the shutter blade () at a constant speed, while the acceleration and deceleration of the shutter blade () take place in the period when the shutter device is in a closed state, which is relatively long and allows a large stroke. This significantly reduces the required torque of the rotating motor () and effectively shortens the shutter opening and closing time.