The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2020
Filed:
Sep. 09, 2016
Applicant:
Kla-tencor Corporation, Milpitas, CA (US);
Inventors:
Brent A. Riggs, Austin, TX (US);
William Pierson, Austin, TX (US);
Assignee:
KLA-Tencor Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); G01B 11/27 (2006.01); G03F 9/00 (2006.01); G01N 21/95 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67259 (2013.01); G01B 11/272 (2013.01); G01N 21/9501 (2013.01); G03F 9/7034 (2013.01); G01N 2201/12 (2013.01);
Abstract
Adaptive alignment methods and systems are disclosed. An adaptive alignment system may include a scanner configured to align a wafer and an analyzer in communication with the scanner. The analyzer may be configured to: recognize at least one defined analysis area; determine whether any perturbations exist within the analysis area; and in response to at least one perturbation determined to be within the analysis area, invoke a fall back alignment strategy or report the at least one perturbation to the scanner.