The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2020
Filed:
Sep. 09, 2016
Dai Nippon Printing Co., Ltd., Tokyo-to, JP;
DAI NIPPON PRINTING CO., LTD., Tokyo, JP;
Abstract
The same digital data is recorded with highly integrated manner on a plurality of media able to durably hold information over long-term. A minute graphic pattern indicating data bit information is drawn on a resist layer formed on a quartz glass substrate by exposing a beam and developed so as to prepare a master medium (M), which comprises the quartz glass substrate having a minute recess and protrusion structure formed by etching where the remaining resist are used as a mask (FIG. (a)). The recess and protrusion structure recorded on the master medium (M) is shaped and transferred onto a flexible recording medium (G) on which a UV curable resin layer () is formed, whereby an intermediate medium (M) is prepared (FIGS. (b)-(d)). The inverted recess and protrusion structure transferred to the intermediate medium (M) is shaped and transferred onto a recording medium (G) comprising a quartz glass substrate () on which a UV curable resin layer () is formed, whereby a reproduction medium (M) having the same recess and protrusion structure as that of the master medium (M) is prepared (FIGS. (e)-(h)). In shaping and transferring process, the media are separated using the flexibility of the intermediate medium (M).