The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 30, 2020

Filed:

Dec. 06, 2016
Applicant:

Asml Holding N.v., Veldhoven, NL;

Inventor:

Parag Vinayak Kelkar, Danbury, CT (US);

Assignee:

ASML Holding N.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 27/14 (2006.01); G02B 7/02 (2006.01); G02B 27/28 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G02B 27/283 (2013.01); G02B 27/142 (2013.01); G03F 7/70116 (2013.01); G03F 7/70133 (2013.01); G03F 7/70566 (2013.01); G03F 7/70633 (2013.01);
Abstract

A method is disclosed that includes splitting a beam of radiation into a first part of the beam having a first polarization and a second part of the beam having a second polarization, forming a first beam with a first polarization distribution between the first polarization and the second polarization and/or a first intensity distribution by modulating the first part of the beam, forming a second beam with a second polarization distribution between the first polarization and the second polarization and/or a second intensity distribution by modulating the second part of the beam, and combining at least a portion of the first beam having the second polarization and at least a portion of the second beam having the first polarization.


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