The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 2020
Filed:
Jan. 08, 2019
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Ulrich Wegmann, Koenigsbronn, DE;
CARL ZEISS SMT GMBH, Oberkochen, DE;
Abstract
The imaging quality of an optical imaging system is interferometrically measured. A wavefront measurement has a first imaging scale βin a first direction and a second imaging scale βin a second, perpendicular direction. The second imaging scale differs from the first imaging scale by a scale ratio (β/β)≠1 (anamorphic imaging system). A first measurement structure (MS) on a first structure carrier arranged on the object side of the imaging system has a two-dimensional mask structure suitable for shaping the coherence of measurement radiation. A second measurement structure (MS) on a second structure carrier arranged on the image side of the imaging system has a diffraction grating. The first and second measurement structures are mutually adapted, taking account of the scale ratio so that an interference pattern arises upon imaging the first measurement structure onto the second measurement structure using the anamorphic imaging system.