The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2020
Filed:
Oct. 24, 2018
International Business Machines Corporation, Armonk, NY (US);
Hosadurga Shobha, Niskayuna, NY (US);
Rudy J. Wojtecki, San Jose, CA (US);
Noel Arellano, Fremont, CA (US);
Ekmini A. De Silva, Slingerlands, NY (US);
INTERNATIONAL BUSINESS MACHINES CORPORATION, Armonk, NY (US);
Abstract
A method for fabricating a semiconductor device includes forming a via in a first dielectric layer arranged on a metal layer. The via exposes a portion of the metal layer. The method includes forming a trench in the first dielectric layer. The method further includes depositing, by a selective process, a second dielectric layer on the first dielectric layer such that the second dielectric layer lines sidewalls of the via and the trench and is selectively deposited onto the first dielectric layer.