The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 2020

Filed:

Jan. 24, 2019
Applicant:

Mentor Graphics Corporation, Wilsonville, OR (US);

Inventors:

Ahmed Abouelseoud, Wilsonville, OR (US);

Sherif Hany Riad Mohammed Mousa, Beaverton, OR (US);

Jonathan James Muirhead, Portland, OR (US);

Assignee:

Mentor Graphics Corporation, Wilsonville, OR (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G06F 30/398 (2020.01); G03F 1/00 (2012.01); G03F 1/36 (2012.01); G06F 30/392 (2020.01);
U.S. Cl.
CPC ...
G06F 30/398 (2020.01); G03F 1/144 (2013.01); G03F 1/36 (2013.01); G06F 30/392 (2020.01);
Abstract

Aspects of the disclosed technology relate to techniques of pattern-based resolution enhancement. Surrounding areas for a plurality of geometric layout elements in a layout design are partitioned into geometric space elements. The plurality of geometric layout elements and the geometric space elements are grouped, through pattern classification, into geometric layout element groups and geometric space element groups, respectively. Optical proximity correction is performed for each of the geometric layout element groups and sub-resolution assist feature insertion is performed for each of the geometric space element groups. The results are applied to the plurality of geometric layout elements and the geometric space elements in the layout design.


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