The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2020
Filed:
Sep. 02, 2016
Kla-tencor Corporation, Milpitas, CA (US);
Hoyoung Heo, Gyeonggi-do, KR;
William Pierson, Austin, TX (US);
Jeremy Nabeth, Austin, TX (US);
Sanghuck Jeon, Gyeonggi-do, KR;
Onur N. Demirer, Austin, TX (US);
Miguel Garcia-Medina, Austin, TX (US);
Soujanya Vuppala, Fremont, CA (US);
KLA-Tencor Corporation, Milpitas, CA (US);
Abstract
Methods and systems for providing overlay corrections are provided. A method may include: selecting an overlay model configured to perform overlay modeling for a wafer; obtaining a first set of modeled results from the overlay model, the first set of modeled results indicating adjustments applicable to a plurality of term coefficients of the overlay model; calculating a significance matrix indicating the significance of the plurality of term coefficients; identifying at least one less significant term coefficient among the plurality of term coefficients based on the calculated significance matrix; obtaining a second set of modeled results from the overlay model, the second set of modeled results indicating adjustments applicable to the plurality of term coefficients except for the identified at least one less significant term coefficient; and providing the second set of modeled results to facilitate overlay correction.