The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2020
Filed:
Dec. 14, 2016
Applicant:
Techinsights Inc., Ottawa, CA;
Inventors:
Robert K. Foster, Dunrobin, CA;
Christopher Pawlowicz, Ottawa, CA;
Jason Abt, Kanata, CA;
Ian Jones, Ottawa, CA;
Heinz Josef Nentwich, Ottawa, CA;
Assignee:
TECHINSIGHTS INC., Ottawa, CA;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F 4/00 (2006.01); G01N 1/32 (2006.01); H01L 23/00 (2006.01); H01J 37/32 (2006.01); H01L 21/263 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
C23F 4/00 (2013.01); G01N 1/32 (2013.01); H01J 37/32935 (2013.01); H01J 37/32963 (2013.01); H01L 21/2633 (2013.01); H01L 22/26 (2013.01); H01L 23/00 (2013.01); H01L 2924/0002 (2013.01);
Abstract
There is provided a method, system and computer program product to delayer a layer of a sample, the layer comprising one or more materials, in an ion beam mill by adjusting one or more operating parameters of the ion beam mill and selectively removing each of the one or more materials at their respective predetermined rates. There is also provided a method and system for obtaining rate of removal of a material from a sample in an ion beam mill.