The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 16, 2020

Filed:

Oct. 08, 2019
Applicant:

Carl Zeiss Smt Gmbh, Oberkochen, DE;

Inventor:

Peter Huber, Heidenheim, DE;

Assignee:

CARL ZEISS SMT GMBH, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G02B 26/06 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70308 (2013.01); G02B 26/06 (2013.01); G03F 7/702 (2013.01); G03F 7/7015 (2013.01); G03F 7/70191 (2013.01); G03F 7/70266 (2013.01); G03F 7/70316 (2013.01); G03F 7/70241 (2013.01);
Abstract

A wavefront correction element for use in an optical system, in particular in an optical system of a microlithographic projection exposure apparatus, includes a substrate (), an arrangement of electrically conductive conductor tracks () provided on the substrate, wherein a wavefront of electromagnetic radiation incident on the wavefront correction element is manipulatable by electrical driving of the conductor tracks, and an insulating layer (), which electrically insulates the conductor tracks from one another, wherein the insulating layer has first regions and second regions, wherein the electrical breakdown strength of the insulating layer to withstand a breakdown of electrical charge through the insulating layer as far as the arrangement of conductor tracks is lower in the second regions than in the first regions by at least a factor of two.


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