The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 09, 2020

Filed:

Jan. 27, 2017
Applicant:

Disco Corporation, Tokyo, JP;

Inventors:

Makoto Tanaka, Tokyo, JP;

Xin Lu, Tokyo, JP;

Assignee:

DISCO CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/66 (2006.01); H01L 21/67 (2006.01); B23K 26/364 (2014.01); B23K 26/03 (2006.01); B23K 26/08 (2014.01); H01L 21/687 (2006.01); H01L 21/78 (2006.01); B23K 101/40 (2006.01);
U.S. Cl.
CPC ...
H01L 22/20 (2013.01); B23K 26/032 (2013.01); B23K 26/0853 (2013.01); B23K 26/364 (2015.10); H01L 21/67051 (2013.01); H01L 21/67092 (2013.01); H01L 21/68764 (2013.01); H01L 21/78 (2013.01); B23K 2101/40 (2018.08); H01L 22/12 (2013.01); H01L 2223/5446 (2013.01);
Abstract

A packaged wafer processing method includes a processing step of processing each division line formed on a packaged wafer by using a laser beam applying unit and a feeding mechanism, and indexing the wafer by a preset index amount 'a' corresponding to the pitch of the division lines by using an indexing mechanism, thereby forming a laser processed groove along each division line. A correcting step images the next division line to be processed in an exposed peripheral portion of the wafer and the laser processed groove just formed along the present division line, at any arbitrary time during the processing step. The distance 'b' between the next division line and the laser processed groove just formed is determined, and then a correction index amount “c” is calculated by using the deviation corresponding to the difference (a−b) between the preset index amount “a” and the distance “b”.


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