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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10679867 B1

PDFFull Text
Date of Patent:
Jun. 09, 2020

Filed:

May. 09, 2017

Plasma processing apparatus

Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventor:

Yohei Yamazawa, Nirasaki, JP;

Assignee:

TOKYO ELECTRON LIMITED, Tokyo, JP;

Attorneys:

Nath, Goldberg & Meyer

Jerald L. Meyer

Primary Examiner:

Ram N Kackar

Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 21/67 (2006.01); H01J 37/32 (2006.01); H01F 21/00 (2006.01); H01F 21/04 (2006.01); H01L 21/3065 (2006.01); H05K 9/00 (2006.01); H01F 30/04 (2006.01); H02M 1/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67063 (2013.01); H01F 21/005 (2013.01); H01F 21/04 (2013.01); H01J 37/32091 (2013.01); H01J 37/32174 (2013.01); H01J 37/32899 (2013.01); H01L 21/3065 (2013.01); H05K 9/0007 (2013.01); H01F 30/04 (2013.01); H02M 2001/007 (2013.01);
Abstract

A capacitively-coupled plasma processing apparatus includes: at least one chamber body providing chambers separated from each other; upper electrodes respectively installed in upper spaces within the chambers; lower electrodes respectively installed in lower spaces within the chambers; a high frequency power supply; a transformer including a primary coil electrically connected to the high frequency power supply, and secondary coils each of which coils having a first end and a second end; first condensers respectively connected between each of the first ends of the secondary coils and the upper electrodes; and second condensers respectively connected between each of the second ends of the secondary coils and the lower electrodes. The primary coil extends around a central axis. The secondary coils are configured to be coaxially disposed with respect to the primary coil. A self-inductance of each of the secondary coils is smaller than that of the primary coil.

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