The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 09, 2020

Filed:

Aug. 06, 2018
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Adib Khan, Cupertino, CA (US);

Qiwei Liang, Fremont, CA (US);

Sultan Malik, Sacramento, CA (US);

Srinivas Nemani, Sunnyvale, CA (US);

Rafika Smati, Santa Clara, CA (US);

Joseph Ng, Santa Clara, CA (US);

John O'Hehir, Santa Clara, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/673 (2006.01); B01D 53/047 (2006.01); B01D 53/04 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
B01D 53/0407 (2013.01); H01L 21/6715 (2013.01); H01L 21/67393 (2013.01);
Abstract

Embodiments of the present disclosure relate to gas abatement apparatus and effluent management. The apparatus described herein include a high pressure process chamber and a containment chamber surrounding the process chamber. A high pressure fluid delivery module is in fluid communication with the high pressure process chamber and is configured to deliver a high pressure fluid to the process chamber. An effluent management module includes a muffler assembly to effluent pressure reduction and a plurality of scrubbers provide for treatment of effluent.


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