The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 02, 2020

Filed:

Aug. 06, 2018
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Kousuke Yoshihara, Koshi, JP;

Takafumi Niwa, Koshi, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01); G03F 7/16 (2006.01); B05C 9/12 (2006.01); B05C 11/08 (2006.01); B05C 13/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02282 (2013.01); B05C 9/12 (2013.01); B05C 11/08 (2013.01); B05C 13/00 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); H01L 21/6715 (2013.01); H01L 21/67028 (2013.01); H01L 21/67253 (2013.01); H01L 21/68764 (2013.01); H01L 21/67109 (2013.01);
Abstract

A method of forming a coating film includes horizontally supporting a substrate, supplying a coating solution to a central portion of the substrate and spreading the coating solution by a centrifugal force by rotating the substrate at a first rotational speed, decreasing a speed of the substrate from the first rotational speed toward a second rotational speed and rotating the substrate at the second rotational speed to make a surface of a liquid film of the coating solution even, supplying a gas to a surface of the substrate when the substrate is rotated at the second rotational speed to reduce fluidity of the coating solution, and drying the surface of the substrate by rotating the substrate at a third rotational speed faster than the second rotational speed.


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