The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 26, 2020

Filed:

Sep. 28, 2017
Applicant:

Mitsubishi Electric Corporation, Chiyoda-ku, Tokyo, JP;

Inventor:

Kazunari Nakata, Tokyo, JP;

Assignee:

MITSUBISHI ELECTRIC CORPORATION, Chiyoda-Ku, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/04 (2006.01); H01L 21/288 (2006.01); H01L 21/304 (2006.01); H01L 29/16 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0485 (2013.01); H01L 21/2885 (2013.01); H01L 21/304 (2013.01); H01L 29/1608 (2013.01); H01L 29/78 (2013.01);
Abstract

Included herein are, a step of forming an active region for a semiconductor device on a front surface of a SiC substrate, a step of forming a SiC substrate-to-drain electrode bonding region on a back surface of the SiC substrate by grinding it using an abrasive whose average abrasive grain size is within a specified range, a step of depositing a film of a first drain electrode on the SiC substrate-to-drain electrode bonding region, a step of electrically connecting the first drain electrode with the SiC substrate-to-drain electrode bonding region, and a step of depositing a film of a second drain electrode on the first drain electrode, so that a SiC semiconductor device having a high mechanical strength with a reduced energization loss is achieved.


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