The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 26, 2020

Filed:

Aug. 08, 2018
Applicant:

Thermo Finnigan Llc, San Jose, CA (US);

Inventors:

Graeme McAlister, San Jose, CA (US);

Chad R. Weisbrod, Tallahassee, FL (US);

Assignee:

Thermo Finnigan LLC, San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 49/10 (2006.01); H01J 49/42 (2006.01); H01J 49/00 (2006.01); H01J 49/06 (2006.01);
U.S. Cl.
CPC ...
H01J 49/0072 (2013.01); H01J 49/0031 (2013.01); H01J 49/065 (2013.01); H01J 49/421 (2013.01); H01J 49/4225 (2013.01); H01J 49/10 (2013.01);
Abstract

A method for parallel accumulation and serial fragmentation of ions, wherein ions are injected into a device capable of serial ejection using a pseudopotential barrier created by an RF voltage. In all instances, the ions may be filtered prior to accumulation in the device capable of serial ejection. In some cases this filtering may take the form of discrete isolation windows using isolation waveforms with multiple notches. In some cases these waveforms may be applied to a quadrupole mass filter. Following accumulation of the precursor ions, the initial population may be serially ejected using a pseudopotential barrier created by an RF voltage. Following serial ejection, the individual precursor ion populations are analyzed. In some cases, this analysis might involve additional rounds of ion isolation and manipulation (e.g., MSn, CID, ETD, etc.).


Find Patent Forward Citations

Loading…