The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 26, 2020

Filed:

May. 09, 2019
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Chia-Ren Lin, Hsinchu, TW;

Penny Hung, Hsinchu, TW;

Hung-Chen Lin, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 13/00 (2006.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
G03F 7/3092 (2013.01);
Abstract

A method for removing air micro-bubbles from photoresist used to purge a new photoresist filter is disclosed. The method includes flowing photoresist through a photoresist filter to remove air trapped in the photoresist filter, where the trapped air forms air micro-bubbles in the photoresist; collecting, in a buffer tank, the photoresist with air micro-bubbles; removing, in the buffer tank, the air micro-bubbles from the photoresist; and transferring the photoresist without air micro-bubbles from the buffer tank to photolithography equipment.


Find Patent Forward Citations

Loading…