The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2020

Filed:

Aug. 22, 2018
Applicant:

United Microelectronics Corp., Hsin-Chu, TW;

Inventors:

Tong-Yu Chen, Hsinchu, TW;

Chia-Fang Lin, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/768 (2006.01); H01L 23/522 (2006.01); H01L 23/532 (2006.01); H01L 23/485 (2006.01);
U.S. Cl.
CPC ...
H01L 21/7682 (2013.01); H01L 23/5222 (2013.01); H01L 23/5226 (2013.01); H01L 23/53295 (2013.01); H01L 23/485 (2013.01);
Abstract

An interconnect layout structure, having a plurality of air gaps, includes a substrate having an insulating material disposed thereon and a conductive line disposed in the insulating material and extending along a first direction. The air gaps are formed in the insulating material and are arranged end-to-end along the first direction and immediately adjacent to a same side of the conductive line. A patterned hard mask is disposed on the conductive line and has a sidewall extending along a second direction that is perpendicular to the first direction and passing between the adjacent air gaps from the top view. A via structure is formed on the conductive line and is electrically connected to the conductive line.


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