The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2020
Filed:
Apr. 01, 2016
Applicant:
Tosoh Smd, Inc., Grove City, OH (US);
Inventors:
Eugene Y. Ivanov, Grove City, OH (US);
Matthew Fisher, Columbus, OH (US);
Alex Kuhn, Columbus, OH (US);
Assignee:
Tosoh SMD, Inc., Grove City, OH (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); C22C 27/02 (2006.01); B21B 1/02 (2006.01); B21B 15/00 (2006.01); C22F 1/18 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/3414 (2013.01); B21B 1/024 (2013.01); B21B 1/026 (2013.01); B21B 15/0007 (2013.01); C22C 27/02 (2013.01); C22F 1/18 (2013.01); H01J 37/3426 (2013.01); B21B 2015/0014 (2013.01); B21B 2015/0021 (2013.01);
Abstract
Methods for making Ta sputter targets and sputter targets made thereby. Ta ingots are compressed along at least two of the x, y, and z dimensions and then cross rolled in at least one of those dimensions. A pair of target blanks is then cut from the cross rolled ingot. The resulting targets have a predominate mix of {100} and {111} textures and have reduced B {100} and B {111} banding factors.