The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2020
Filed:
Jan. 30, 2018
Applicant:
Fei Company, Hillsboro, OR (US);
Inventors:
Leon van Kouwen, Rotterdam, NL;
Gerard Nicolaas Anne van Veen, Waalre, NL;
Assignee:
FEI Company, Hillsboro, OR (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/08 (2006.01); H01J 37/147 (2006.01); H01J 37/28 (2006.01); H01J 37/26 (2006.01);
U.S. Cl.
CPC ...
H01J 37/08 (2013.01); H01J 37/147 (2013.01); H01J 37/261 (2013.01); H01J 37/28 (2013.01); H01J 2237/082 (2013.01); H01J 2237/0822 (2013.01); H01J 2237/0827 (2013.01); H01J 2237/31745 (2013.01); H01J 2237/31749 (2013.01);
Abstract
A source assembly for ion beam production is disclosed herein. An example source assembly may include a pair of plates separated by a distance, with each plate having an aperture, and the respective apertures aligned, and an ionization space defined at least by the distance and the respective apertures, where a ratio of the distance to an ionic mean free path of a gas in the ionization space is greater than one.