The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2020
Filed:
May. 10, 2017
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Wendell Glenn Boyd, Jr., Morgan Hill, CA (US);
Govinda Raj, Bangalore, IN;
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/40 (2006.01); G01B 9/02 (2006.01); G01B 11/14 (2006.01); H01J 37/32 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
G01B 9/02023 (2013.01); G01B 11/14 (2013.01); H01J 37/32715 (2013.01); H01L 21/67259 (2013.01);
Abstract
Embodiments disclosed herein include a faceplate having a sensor assembly, a processing chamber having the same, and a method for monitoring a substrate in a processing chamber. In one embodiment, a faceplate is configured to introduce processing gases into a plasma processing chamber. The faceplate has one or more holes. A sensor assembly is disposed in the one or more holes. The sensor assembly has a sensor and a controller.
Published as:
US2017350688A1; WO2017209901A2; TW201809595A; WO2017209901A3; KR20190002748A; CN109219863A; JP2019518140A; TWI673473B; US10648788B2; KR102113453B1; CN109219863B; JP6880076B2;
Boyd, Jr., Wendell. (2020). Substrate distance monitoring (U.S. Patent No. 10648788). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10648788
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile