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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10643909 B1

PDFFull Text
Date of Patent:
May. 05, 2020

Filed:

Jul. 12, 2017

Inspecting method for inspecting influence of installation environment upon processing apparatus

Applicant:

Disco Corporation, Tokyo, JP;

Inventor:

Hiroyuki Yoshihara, Tokyo, JP;

Assignee:

DISCO CORPORATION, Tokyo, JP;

Attorney:

Greer Burns & Crain, Ltd.

Primary Examiner:

Brigitte A Paterson

Int. Cl.
CPC ...
H01L 21/66 (2006.01); H01L 21/67 (2006.01); H01L 21/68 (2006.01); B23K 26/06 (2014.01); B23K 26/08 (2014.01); G01R 31/01 (2020.01); G01R 31/28 (2006.01);
U.S. Cl.
CPC ...
H01L 22/24 (2013.01); B23K 26/0626 (2013.01); B23K 26/08 (2013.01); G01R 31/01 (2013.01); G01R 31/2851 (2013.01); H01L 21/67092 (2013.01); H01L 21/67259 (2013.01); H01L 21/67276 (2013.01); H01L 21/67288 (2013.01); H01L 21/681 (2013.01); G01R 31/2881 (2013.01);
Abstract

A method for inspecting the influence of an installation environment upon a processing apparatus includes setting a mark for specifying a relative positional relation between a chuck table and a processing unit, imaging the mark plural times by using an imaging unit when a moving unit is at rest, and detecting the position of the mark from an image and then determining whether or not the influence of the installation environment upon the processing apparatus is present based on whether the change in position of the mark is less than or more than a threshold.

Find Patent Forward Citations

Yoshihara, Hiroyuki. (2020). Inspecting method for inspecting influence of installation environment upon processing apparatus (U.S. Patent No. 10643909). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10643909

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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