The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 2020
Filed:
Apr. 25, 2018
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., Hsinchu, TW;
Abstract
A method is disclosed that includes: if there is a conflict graph including a sub-graph representing that each spacing between any two of three adjacent patterns of quadruple-patterning (QP) patterns in at least one of two abutting cells is smaller than a threshold spacing, performing operations including: identifying if one of edges that connect the three adjacent patterns of QP patterns to one another is constructed along, and/or in parallel with, a boundary between the two abutting cells; modifying multiple-patterning patterns of a layout of an integrated circuit (IC) to exclude patterns representing the sub-graph; and initiating generation of the IC from the modified multiple-patterning patterns, wherein at least one operation of identifying, modifying, or initiating is performed by at least one processor.