The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 2020
Filed:
Mar. 17, 2016
Applicant:
Mitsubishi Gas Chemical Company, Inc., Tokyo, JP;
Inventors:
Takumi Toida, Kanagawa, JP;
Masatoshi Echigo, Tokyo, JP;
Takashi Sato, Kanagawa, JP;
Youko Shimizu, Kanagawa, JP;
Assignee:
Mitsubishi Gas Chemical Company, Inc., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/038 (2006.01); G03F 7/004 (2006.01); C08G 83/00 (2006.01); C08L 61/12 (2006.01); C07C 39/15 (2006.01); C08G 8/04 (2006.01); C08G 8/20 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
G03F 7/038 (2013.01); C07C 39/15 (2013.01); C08G 8/04 (2013.01); C08G 8/20 (2013.01); C08G 83/00 (2013.01); C08L 61/12 (2013.01); G03F 7/004 (2013.01); C07C 2601/16 (2017.05); G03F 7/16 (2013.01); G03F 7/20 (2013.01); G03F 7/30 (2013.01);
Abstract
The present invention provides a resist base material containing a compound having a specific structure and/or a resin derived from the compound as a monomer.
Toida, Takumi. (2020). Resist base material, resist composition and method for forming resist pattern (U.S. Patent No. 10642156). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10642156
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile