The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 2020

Filed:

Feb. 22, 2016
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Yuichi Takenaga, Iwate, JP;

Hiroichi Ota, Iwate, JP;

Shingo Sekisawa, Iwate, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/52 (2006.01); C23C 16/46 (2006.01); H01L 21/67 (2006.01); C23C 16/458 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 16/52 (2013.01); C23C 16/4583 (2013.01); C23C 16/45578 (2013.01); C23C 16/46 (2013.01); H01L 21/67109 (2013.01);
Abstract

A heat treatment system includes a heating unit that heats an inside of a processing chamber in which a plurality of workpieces are accommodated; a heat treatment condition storing unit that stores a heat treatment condition; a heat treatment change model storing unit that stores a heat treatment change model; a heat treatment performing unit that performs the heat treatment condition; a heat treatment result receiving unit that receives a result of heat treatment performed; and an optimum temperature calculating unit that calculate a target heat treatment result for an in-plane shape of the workpiece based on a target heat treatment result and information about a shape of the target heat treatment result, and calculate an optimum temperature that results in the target heat treatment result, based on the calculated target heat treatment result and the heat treatment change model.


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