The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 2020

Filed:

Dec. 18, 2017
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Tae-yeong Kim, Yongin-si, KR;

Pil-kyu Kang, Hwaseong-si, KR;

Seok-ho Kim, Hwaseong-si, KR;

Kwang-jin Moon, Hwaseong-si, KR;

Na-ein Lee, Seoul, KR;

Ho-jin Lee, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 37/10 (2006.01); H01L 21/67 (2006.01); H01L 23/00 (2006.01); H01L 21/68 (2006.01); H01L 21/687 (2006.01); H01L 21/683 (2006.01); B32B 38/18 (2006.01);
U.S. Cl.
CPC ...
B32B 37/10 (2013.01); B32B 38/1808 (2013.01); H01L 21/67092 (2013.01); H01L 21/67253 (2013.01); H01L 21/681 (2013.01); H01L 21/6838 (2013.01); H01L 21/68785 (2013.01); H01L 24/08 (2013.01); H01L 24/75 (2013.01); H01L 24/80 (2013.01); H01L 24/83 (2013.01); B32B 38/1858 (2013.01); B32B 2457/14 (2013.01); H01L 24/94 (2013.01); H01L 2224/08145 (2013.01); H01L 2224/7592 (2013.01); H01L 2224/75724 (2013.01); H01L 2224/75725 (2013.01); H01L 2224/75744 (2013.01); H01L 2224/75982 (2013.01); H01L 2224/80908 (2013.01); H01L 2224/94 (2013.01);
Abstract

Provided are a wafer bonding apparatus for accurately detecting a bonding state of wafers in a wafer bonding process and/or in a wafer bonding system including the wafer bonding apparatus. The wafer bonding apparatus includes a first supporting plate including a first surface and vacuum grooves for vacuum-absorption of a first wafer disposed on the first surface, a second supporting plate including a second surface facing the first surface. A second wafer is on the second surface. The wafer bonding apparatus and/or the wafer bonding system include a bonding initiator at a center portion of the first supporting plate, and an area sensor on the first supporting plate and configured to detect a propagation state of bonding between the first wafer and the second wafer.


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