The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 28, 2020

Filed:

Sep. 25, 2018
Applicant:

Magnachip Semiconductor, Ltd., Cheongju-si, KR;

Inventors:

Jeong Hyeon Park, Daejeon, KR;

Bo Seok Oh, Cheongju-si, KR;

Hee Hwan Ji, Daejeon, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H03K 17/687 (2006.01); H01L 21/8234 (2006.01); G09G 3/36 (2006.01); G11C 19/28 (2006.01); H01L 27/088 (2006.01); H01L 29/417 (2006.01); H01L 29/78 (2006.01); H03K 19/0175 (2006.01); H01L 29/423 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H03K 17/6871 (2013.01); G09G 3/3688 (2013.01); G11C 19/28 (2013.01); H01L 21/823418 (2013.01); H01L 21/823462 (2013.01); H01L 27/088 (2013.01); H01L 29/41775 (2013.01); H01L 29/7835 (2013.01); H03K 19/017509 (2013.01); G09G 2300/0408 (2013.01); G09G 2300/0828 (2013.01); G09G 2300/0838 (2013.01); G09G 2300/0871 (2013.01); G09G 2310/0291 (2013.01); H01L 29/42368 (2013.01); H01L 29/665 (2013.01); H01L 29/7833 (2013.01);
Abstract

A semiconductor device includes a first transistor, a second transistor, and a third transistor. The first transistor includes a first gate insulator, a first source region and a first drain region, a pair of lightly doped drain (LDD) regions that are each shallower than the first source region and the first drain region, and a first gate electrode. The second transistor includes a second gate insulator, a second source region and a second drain region, a pair of drift regions that encompass the second source region and the second drain region respectively, and a second gate electrode, and the third transistor comprises a third gate insulator, a third source region and a third drain region, and a pair of drift regions that encompass the third source and the third drain regions respectively, and a third gate electrode. The second gate insulator is thinner than the other gate insulators.


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