The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2020
Filed:
Jan. 14, 2016
Applicant:
Orbotech Ltd., Yavne, IL;
Inventors:
Zvi Kotler, Tel Aviv, IL;
Michael Zenou, Hashmonaim, IL;
Assignee:
ORBOTECH LTD., Yavne, IL;
Primary Examiner:
Int. Cl.
CPC ...
C25F 3/02 (2006.01); C23C 14/04 (2006.01); C23C 26/02 (2006.01); C23C 14/28 (2006.01); B33Y 10/00 (2015.01); B33Y 80/00 (2015.01); B33Y 30/00 (2015.01); C23C 26/00 (2006.01); B22F 5/10 (2006.01); B33Y 40/00 (2020.01); B22F 3/11 (2006.01); B22F 3/105 (2006.01); C25F 7/00 (2006.01); C25F 3/14 (2006.01); C23C 14/30 (2006.01); C25F 3/12 (2006.01); H01L 21/3063 (2006.01); H01L 21/428 (2006.01); H01L 21/48 (2006.01);
U.S. Cl.
CPC ...
C25F 3/02 (2013.01); B22F 3/1055 (2013.01); B22F 3/1103 (2013.01); B22F 5/10 (2013.01); B33Y 10/00 (2014.12); B33Y 30/00 (2014.12); B33Y 40/00 (2014.12); B33Y 80/00 (2014.12); C23C 14/048 (2013.01); C23C 14/28 (2013.01); C23C 14/30 (2013.01); C23C 26/00 (2013.01); C23C 26/02 (2013.01); C25F 3/12 (2013.01); C25F 3/14 (2013.01); C25F 7/00 (2013.01); H01L 21/3063 (2013.01); H01L 21/428 (2013.01); H01L 21/4867 (2013.01); B22F 2003/1056 (2013.01); B22F 2003/1058 (2013.01); B22F 2005/103 (2013.01); B22F 2999/00 (2013.01); Y02P 10/295 (2015.11);
Abstract
A method for 3D printing includes printing a first metallic material on a substrate as a support structure (). A second metallic material, which is less anodic than the first metallic material, is printed on the substrate as a target structure (), in contact with the support structure. The support structure is chemically removed from the target structure by applying a galvanic effect to selectively corrode the first metallic material.