The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2020
Filed:
Apr. 26, 2018
Method and system for the removal and/or avoidance of contamination in charged particle beam systems
Applicant:
Asml Netherlands B.v., AH Veldhoven, NL;
Inventors:
Marc Smits, Delft, NL;
Johan Joost Koning, Delft, NL;
Chris Franciscus Jessica Lodewijk, Delft, NL;
Hindrik Willem Mook, Delft, NL;
Ludovic Lattard, Delft, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
B08B 7/04 (2006.01); H01J 37/02 (2006.01); H01J 37/317 (2006.01); B08B 17/02 (2006.01); H01J 37/147 (2006.01); H01J 37/18 (2006.01);
U.S. Cl.
CPC ...
B08B 7/04 (2013.01); B08B 17/02 (2013.01); H01J 37/02 (2013.01); H01J 37/1472 (2013.01); H01J 37/18 (2013.01); H01J 37/3177 (2013.01); H01J 2237/006 (2013.01); H01J 2237/022 (2013.01); H01J 2237/0435 (2013.01); H01J 2237/0453 (2013.01); H01J 2237/0492 (2013.01);
Abstract
A charged particle beam system is disclosed, comprising: Further, a method for preventing or removing contamination in the charged particle transmitting apertures is disclosed, comprising the step of introducing the cleaning agent while the beam generator is active.