The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2020
Filed:
Aug. 08, 2018
Applicant:
Gigaphoton Inc., Tochigi, JP;
Inventors:
Tatsuya Yanagida, Hiratsuka, JP;
Osamu Wakabayashi, Hiratsuka, JP;
Assignee:
Gigaphoton Inc., Tochigi, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 3/10 (2006.01); H05G 2/00 (2006.01); H01S 3/08 (2006.01); H01S 3/23 (2006.01);
U.S. Cl.
CPC ...
H01S 3/10061 (2013.01); H01S 3/08054 (2013.01); H05G 2/003 (2013.01); H05G 2/008 (2013.01); H01S 3/08059 (2013.01); H01S 3/2308 (2013.01); H01S 3/2383 (2013.01); H01S 2301/20 (2013.01);
Abstract
An extreme ultraviolet light generation system used with a laser apparatus may be provided, and the extreme ultraviolet light generation system may include: a chamber including at least one window for at least one laser beam and a target supply unit for supplying a target material into the chamber; and at least one polarization control unit, provided on a laser beam path, for controlling a polarization state of the at least one laser beam.