The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2020
Filed:
Apr. 24, 2019
Kyushu University, Fukuoka, JP;
Gigaphoton Inc., Tochigi, JP;
Tomoyuki Ohkubo, Fukuoka, JP;
Hiroshi Ikenoue, Fukuoka, JP;
Akihiro Ikeda, Fukuoka, JP;
Tanemasa Asano, Fukuoka, JP;
Osamu Wakabayashi, Oyama, JP;
Kyushu University, Fukuoka, JP;
Gigaphoton Inc., Tochigi, JP;
Abstract
The laser doping apparatus may irradiate a predetermined region of a semiconductor material with a pulse laser beam to perform doping. The laser doping apparatus may include: a solution supplying system configured to supply dopant-containing solution to the predetermined region, and a laser system including at least one laser device configured to output the pulse laser beam to be transmitted by the dopant-containing solution, and a time-domain pulse waveform changing apparatus configured to control a time-domain pulse waveform of the pulse laser beam.