The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2020
Filed:
Apr. 08, 2016
Lltech Management, Paris, FR;
Albert Claude Boccara, Paris, FR;
Fabrice Harms, Orsay, FR;
LLTECH MANAGEMENT, Paris, FR;
Abstract
The invention relates to a system () for full-field interference microscopy imaging of a three-dimensional diffusing sample (). Said system includes: —an interference device () including a reference arm on which a reflective surface () is arranged, the interference device being suitable for producing, at each point of an imaging field when the sample is placed on a target arm of the interference device, interference between a reference wave, obtained by reflection of incident light waves onto a basic surface of the reflective surface () corresponding to said point of the imaging field, and a target wave obtained by backscattering of incident light waves by means of a voxel of a slice of the sample at a given depth, said voxel corresponding to said point of the imaging field; —an acquisition device () suitable for acquiring, at a fixed path length difference between the target arm and the reference arm, a temporal series of N two-dimensional interferometric signals resulting from the interference produced at each point of the imaging field; and —a processing unit () configured to calculate an image (IB, IC) representing temporal variations in intensity between said N two-dimensional interferometric signals.