The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2020
Filed:
Apr. 05, 2015
Applicant:
Orbotech Ltd., Yavne, IL;
Inventors:
Michael Zenou, Hashmonaim, IL;
Zvi Kotler, Tel Aviv, IL;
Jonathan Ankri, Ramle, IL;
Abraham Rotnemer, Jerusalem, IL;
Oleg Ermak, Netanya, IL;
Assignee:
ORBOTECH LTD., Yavne, IL;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/70 (2006.01); H05K 3/02 (2006.01); H01L 21/48 (2006.01); H05K 1/09 (2006.01); H05K 3/10 (2006.01); H01L 23/15 (2006.01);
U.S. Cl.
CPC ...
H01L 21/705 (2013.01); H01L 21/4867 (2013.01); H05K 3/02 (2013.01); H01L 23/15 (2013.01); H05K 1/097 (2013.01); H05K 3/105 (2013.01); H05K 2203/107 (2013.01); H05K 2203/1492 (2013.01);
Abstract
A method for manufacturing includes coating a substrate () with a matrix () containing a material to be patterned on the substrate. A pattern is fixed in the matrix by directing a pulsed energy beam to impinge on a locus of the pattern so as to cause adhesion of the material to the substrate along the pattern without fully sintering the material in the pattern. The matrix remaining on the substrate outside the fixed pattern is removed, and after removing the matrix, the material in the pattern is sintered.