The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2020
Filed:
May. 25, 2017
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Keith Tatseun Wong, Los Gatos, CA (US);
Thomas Jongwan Kwon, Dublin, CA (US);
Sean Kang, San Ramon, CA (US);
Ellie Y. Yieh, San Jose, CA (US);
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/285 (2006.01); C23C 16/14 (2006.01); C23C 16/08 (2006.01); C23C 16/56 (2006.01); H01L 21/768 (2006.01); H01L 27/115 (2017.01); H01L 27/11551 (2017.01); H01L 27/11578 (2017.01);
U.S. Cl.
CPC ...
H01L 21/28556 (2013.01); C23C 16/08 (2013.01); C23C 16/14 (2013.01); C23C 16/56 (2013.01); H01L 21/28568 (2013.01); H01L 21/76883 (2013.01); H01L 27/115 (2013.01); H01L 27/11551 (2013.01); H01L 27/11578 (2013.01);
Abstract
Methods and systems relating to processes for treating a tungsten film on a workpiece including supporting the workpiece in a chamber, introducing hydrogen gas into the chamber and establishing a pressure of at least 5 atmospheres, and exposing the tungsten film on the workpiece to the hydrogen gas while the pressure in the chamber is at least 5 atmospheres.