The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2020
Filed:
Jun. 24, 2015
Applicant:
Intel Corporation, Santa Clara, CA (US);
Inventors:
Sasikanth Manipatruni, Hillsboro, OR (US);
Anurag Chaudhry, Portland, OR (US);
Dmitri E. Nikonov, Beaverton, OR (US);
David J. Michalak, Portland, OR (US);
Ian A. Young, Portland, OR (US);
Assignee:
Intel Corporation, Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01F 10/32 (2006.01); H01F 41/30 (2006.01); H01F 10/193 (2006.01); H03K 19/16 (2006.01); H01L 43/12 (2006.01); H01L 43/10 (2006.01); H01L 43/08 (2006.01); H01F 10/30 (2006.01); B82Y 25/00 (2011.01);
U.S. Cl.
CPC ...
H01F 10/3254 (2013.01); H01F 10/1936 (2013.01); H01F 10/30 (2013.01); H01F 10/329 (2013.01); H01F 41/308 (2013.01); H01L 43/08 (2013.01); H01L 43/10 (2013.01); H01L 43/12 (2013.01); H03K 19/16 (2013.01); B82Y 25/00 (2013.01);
Abstract
Described is an apparatus which comprises: an input magnet formed of one or more materials with a sufficiently high anisotropy and sufficiently low magnetic saturation to increase injection of spin currents; and a first interface layer coupled to the input magnet, wherein the first interface layer is formed of non-magnetic material such that the first interface layer and the input magnet together have sufficiently matched atomistic crystalline layers.