The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 2020

Filed:

Mar. 21, 2019
Applicant:

Kla-tencor Corporation, Milpitas, CA (US);

Inventors:

Soren Konecky, Alameda, CA (US);

Robert Danen, Pleasanton, CA (US);

Assignee:

KLA-Tencor Corp., Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/95 (2006.01); G01N 21/956 (2006.01); G06T 7/00 (2017.01); G01N 23/2251 (2018.01); G06T 7/12 (2017.01); G06K 9/62 (2006.01); G06T 3/40 (2006.01); G06T 7/174 (2017.01);
U.S. Cl.
CPC ...
G06T 7/001 (2013.01); G01N 21/9501 (2013.01); G01N 21/956 (2013.01); G01N 23/2251 (2013.01); G06K 9/6201 (2013.01); G06T 3/4053 (2013.01); G06T 7/0006 (2013.01); G06T 7/12 (2017.01); G06T 7/174 (2017.01); G01N 2223/401 (2013.01); G06T 2207/20224 (2013.01); G06T 2207/30148 (2013.01);
Abstract

Methods and systems for determining boundaries of patterned features formed on a specimen from an unresolved image of the specimen are provided. One system includes computer subsystem(s) configured for comparing a difference image in which patterned feature(s) are unresolved to different simulated images. The different simulated images are generated by simulating difference images generated for the patterned feature(s) formed on the specimen with different perturbations, respectively. The computer subsystem(s) are configured for, based on the comparing, assigning an amplitude to each of the different perturbations. The computer subsystem(s) are further configured for determining one or more boundaries of the patterned feature(s) formed on the specimen by applying the different perturbations to one or more designed boundaries of the patterned feature(s) with the assigned amplitudes.


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