The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2020
Filed:
Apr. 18, 2016
Asml Netherlands B.v., Veldhoven, NL;
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Pieter Bart Aloïs De Buck, Eindhoven, NL;
Nico Vanroose, Borgerhout, BE;
Giovanni Imponente, Eindhoven, NL;
Roland Johannes Wilhelmus Stas, 's-Hertogenbosch, NL;
Chanpreet Kaur, Eindhoven, NL;
James Robert Downes, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method comprising illuminating a patterning device (MA') comprising a plurality of patterned regions (-) of which each patterns a measurement beam (-), projecting, with a projection system (PL), the measurement beams onto a sensor apparatus () comprising a plurality of detector regions (-), making a first measurement of radiation when the patterning device and the sensor apparatus are positioned in a first relative configuration, moving at least one of the patterning device and the sensor apparatus so as to change the relative configuration of the patterning device to a second relative configuration, making a second measurement of radiation when the patterning device and the sensor apparatus are positioned in the second relative configuration in which at least some of the plurality of detector regions receive a different measurement beam to the measurement beam which was received at the respective detector region in the first relative configuration and determining aberrations caused by the projection system.