The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2020
Filed:
Nov. 16, 2017
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventor:
Yoshikazu Furusawa, Nirasaki, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B01D 45/00 (2006.01); C23C 16/54 (2006.01); C23C 16/455 (2006.01); C23C 16/458 (2006.01); C23C 16/44 (2006.01); H01L 21/67 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C23C 16/54 (2013.01); C23C 16/4408 (2013.01); C23C 16/4412 (2013.01); C23C 16/4583 (2013.01); C23C 16/45534 (2013.01); C23C 16/45546 (2013.01); C23C 16/45561 (2013.01); C23C 16/45578 (2013.01); H01L 21/02104 (2013.01); H01L 21/67017 (2013.01);
Abstract
There is provided a substrate processing apparatus, including: a process vessel configured to accommodate a plurality of substrates; a gas supply part configured to supply a gas into the process vessel; an exhaust part configured to exhaust the gas in the process vessel; and a scavenging part configured to scavenge an interior of the gas supply part, wherein the gas supply part is connected to the scavenging part.