The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2020
Filed:
Oct. 20, 2016
Applied Materials, Inc., Santa Clara, CA (US);
Ashwin Chockalingam, San Jose, CA (US);
Mahendra C. Orilall, Santa Clara, CA (US);
Mayu Yamamura, San Carlos, CA (US);
Boyi Fu, San Jose, CA (US);
Rajeev Bajaj, Fremont, CA (US);
Daniel Redfield, Morgan Hill, CA (US);
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
Implementations described herein generally relate to polishing articles and methods of manufacturing polishing articles used in polishing processes and cleaning processes. More particularly, implementations disclosed herein relate to composite polishing articles having graded properties. In one implementation, a polishing article is provided. The polishing article comprises one or more exposed first regions formed from a first material and having a first zeta potential and one or more second exposed regions formed from a second material and having a second zeta potential, wherein the first zeta potential is different from the second zeta potential.