The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 07, 2020

Filed:

Dec. 12, 2014
Applicant:

Semiconductor Manufacturing International (Shanghai) Corporation, Shanghai, CN;

Inventor:

Deyuan Xiao, Shanghai, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/8238 (2006.01); H01L 29/66 (2006.01); H01L 29/739 (2006.01); H01L 27/092 (2006.01); H01L 27/12 (2006.01); H01L 29/08 (2006.01); H01L 21/84 (2006.01); H01L 29/06 (2006.01);
U.S. Cl.
CPC ...
H01L 21/823821 (2013.01); H01L 27/0924 (2013.01); H01L 29/66356 (2013.01); H01L 29/7391 (2013.01); H01L 21/845 (2013.01); H01L 27/1211 (2013.01); H01L 29/0657 (2013.01); H01L 29/083 (2013.01);
Abstract

A fin tunneling field effect transistor (TFET) is disclosed. The fin TFET includes a semiconductor body extending in a first direction on a substrate, wherein the semiconductor body constitutes a channel of the fin TFET. The fin TFET also includes a source and a drain disposed at opposite ends of the semiconductor body, wherein the source is doped with a first dopant type and the drain is doped with a second dopant type, and the first dopant type is different from the second dopant type. The fin TFET further includes a gate disposed on at least two sides of the channel, wherein a portion of the source is disposed in contact with a portion of the channel.


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